PENGARUH RAPAT ARUS PULSA ELEKTRODEPOSISI TERHADAP SIFAT DAN KARAKTERISTIK LAPISAN NIKEL

BAYYINAH, . (2024) PENGARUH RAPAT ARUS PULSA ELEKTRODEPOSISI TERHADAP SIFAT DAN KARAKTERISTIK LAPISAN NIKEL. Sarjana thesis, UNIVERSITAS NEGERI JAKARTA.

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Abstract

Dalam penelitian ini, telah dilakukan pembentukan dan analisis lapisan Ni pada variasi rapat arus 0,35 mA/mm2, 0,4 mA/mm2, dan 0,45 mA/mm2. Pelapisan elektrodeposisi menggunakan rangkaian Pulse Width Modulation (PWM) pada temperatur 40℃ selama 30 menit. Sampel dianalisis morfologi dan komposisinya menggunakan SEM-EDS. Peningkatan rapat arus pulsa menunjukkan penghalusan morfologi permukaan lapisan Ni dan kenaikan komposisi nikel. Selanjutnya sampel dianalisis struktur kristal dan ukuran kristal menggunakan X-Ray Diffraction (XRD). Struktur kristal yang terbentuk pada lapisan Ni dengan fasa Ni adalah Kubik. Peningkatan rapat arus menyebabkan perubahan ukuran kristal fasa Ni. Pada rapat arus pulsa 0,4 mA/mm2 terjadi pertumbuhan kristal dan pada rapat arus pulsa 0,45 mA/mm2 terjadi penurunan kristal, sehingga ukuran kristal kembali turun. Lalu sampel dianalisis kekerasannya menggunakan Vickers dan terjadi peningkatan kekerasan seiring dengan peningkatan rapat arus pulsa. Kekerasan optimum sebesar 1841,3957 kgf/mm2 didapatkan pada lapisan Ni dengan rapat arus pulsa 0,45 mA/mm2. Kata kunci: Elektrodeposisi, lapisan nikel, rapat arus pulsa, kekerasan ********** In this study, the formation and analysis of Ni layers were carried out with current density variations of 0,35 mA/mm², 0,4 mA/mm², and 0,45 mA/mm². The electrodeposition coating used an Pulse Width Modulation (PWM) circuit at a temperature of 40℃ for 30 minutes. The samples were analyzed for morphology and composition using SEM-EDS. An increase in pulse current density showed a refinement in the surface morphology of the Ni layer and an increase in nickel composition. Furthermore, the samples were analyzed for crystal structure and crystal size using X-Ray Diffraction (XRD). The crystal structure formed in the Ni layer with the Ni phase is cubic. The increase in current density caused changes in the crystallite size of the Ni phase. At a pulse current density of 0,4 mA/mm², crystal growth occurred, and at a pulse current density of 0,45 mA/mm², a reduction in crystallite size occurred, thus reducing the crystal size again. The samples were then analyzed for hardness using Vickers, and there was an increase in hardness with increasing pulse current density. The optimum hardness of 1841,3957 kgf/mm² was obtained in the Ni layer with a pulse current density of 0,45 mA/mm². Keywords: Electrodeposition, nickel layer, pulse current density, hardness.

Item Type:	Thesis (Sarjana)
Additional Information:	1). Dr. Esmar Budi, M.T. ; 2). Dr. Teguh Budi Prayitno, M.Si.
Subjects:	Sains > Sains, Ilmu Pengetahuan Alam Sains > Fisika
Divisions:	FMIPA > S1 Fisika
Depositing User:	Users 24440 not found.
Date Deposited:	05 Aug 2024 00:07
Last Modified:	05 Aug 2024 00:07
URI:	http://repository.unj.ac.id/id/eprint/48161

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