., Achmad Fikry (2018) DEPOSISI LAPISAN KOMPOSIT Ni-TiAIN/Si₃N₄ MMENGGUNAKAN METODE ELEKTRODEPOSISI DENGAN VARIASI KONSENTRASI Si₃N₄. Sarjana thesis, UNIVERSITAS NEGERI JAKARTA.
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Abstract
Pembuatan lapisan komposit Ni-TiAIN/SisN4 telah dilakukan untuk mengkaji pengaruh konsentrasi SisN4 terhadap morfologi permukaan, struktur kristal dan kekerasan lapisan komposit Ni-TiAIN/SisN4. Proses pelapisan menggunakan metode elektrodeposisi. Larutan elektrolit yang digunakan terdiri atas 0.17 mol/l NiCl2.6H2O, 0.38 mol/l NiSO4.6H2O, 4 g/l TiN, 4 g/l AIN, 0.49 mol/| HзBOз dan 1.2 g/l SDS. Sementara variasi konsentrasi SigN4 sebesar 0.2 g/l, 0.4 g/1 dan 0.6 g/l. Sebelum proses elektrodeposisi larutan elektrolit diaduk terlebih dahulu selama 24 jam. Proses elektrodeposisi berlangsung dengan arus sebesar 4 mA selama 15 menit. Sistem elektroda yang digunakan terdiri atas AgCl sebagai elektroda pembanding, Pt sebagai elektroda pendukung dan Tungsten Karbida sebagai elektroda kerja. Berdasarkan hasil karakterisasi Scanning Electron Microscopy (SEM) dan Energy Dispersive Spectroscopy (EDS), morfologi permukaan lapisan cenderung semakin kompak seiring bertambahnya konsentrasi Si3N4 dengan penurunan komposisi lapisan komposit Ni-TiAIN/Si3N4. Berdasarkan hasil karakterisasi X-Ray Diffraction (XRD) dan uji keras Vickers terjadi penurunan ukuran kristal Ni serta peningkatan nilai kekerasan lapisan seiring bertambanya konsentrasi Si3N4. *** Ni-TiAIN/Si3N4 composite film was succesfully electrodeposited to investigate SizN4 consentration effect on composite film morphology, crystal structure and hardness of composite film. The electrolyte consists of 0.17 mol/l NiCl.6H2O, 0.38 mol/l NiSO4.6H2O, 4 g/1 TiN, 4 g/1 AIN, 0.49 mol/l HзBO3 and 1.2 g/1 SDS. Meanwhile the variation of SizN4 concentration is 0.2 g/l, 0.4 g/l, and 0.6 g/l. The electrolyte was stirred for 24 hours. The composite film was electrodeposited at fixed current of 4 mA for 15 minutes. The electrode system was used AgCl as reference electrode, Pt as counter electrode and Tungsten Carbide as working electrode. Based on the characterization test of Scanning Electron Microscopy (SEM) and Energy Dispersive Spectroscopy (EDS), coating surface morphology was finer as increase of SisN4 concentration by decreasing Ni-TiAIN/SisN4 composite coating composition. Based on the characterization test of X-Ray Diffraction (XRD) and Vickers Hardness, crystallite size of Ni decreased and hardness increased as increasing of SisN4 concentration.
| Item Type: | Thesis (Sarjana) |
|---|---|
| Additional Information: | 1). Dr. Esmar Budi, M. T ; 2.) Dr. Iwan Sugihartono, M. Si |
| Subjects: | Sains > Fisika |
| Divisions: | FMIPA > S1 Fisika |
| Depositing User: | PKL . |
| Date Deposited: | 15 Jun 2026 04:30 |
| Last Modified: | 15 Jun 2026 04:30 |
| URI: | http://repository.unj.ac.id/id/eprint/66313 |
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